Pressure mapping apparatus and method of cleaning glass substrate by using the same

• Main Authors: SONG, YOUNGOON, PARK, JUN-UK, KIM, SANGMO, PARK, SUNG-HA
• Format: Patent
• Language: Chinese; English
• Published: 11.11.2023
• Subjects: MEASURING; MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER,MECHANICAL EFFICIENCY, OR FLUID PRESSURE; PHYSICS; TESTING

A pressure mapping apparatus and a method of cleaning a glass substrate by using the same are provided. The pressure mapping apparatus includes a supporting substrate, a plurality of pressure sensors arranged on the supporting substrate, each being configured to output a signal in response to pressure applied thereto, a waterproof pouch surrounding the supporting substrate, and an analyzer configured to receive the signal from each of the plurality of pressure sensors and output in real time a pressure map on the supporting substrate based on the received signal. By using the pressure mapping apparatus and the method of cleaning a glass substrate by using the same according, an objective and quantitative test may be performed without a deviation between workers in a cleaning process, and thus, product defects such as particle defects are considerably reduced.