Pressure mapping apparatus and method of cleaning glass substrate by using the same
A pressure mapping apparatus and a method of cleaning a glass substrate by using the same are provided. The pressure mapping apparatus includes a supporting substrate, a plurality of pressure sensors arranged on the supporting substrate, each being configured to output a signal in response to pressu...
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Main Authors | , , , |
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Format | Patent |
Language | Chinese English |
Published |
11.11.2023
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Subjects | |
Online Access | Get full text |
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Summary: | A pressure mapping apparatus and a method of cleaning a glass substrate by using the same are provided. The pressure mapping apparatus includes a supporting substrate, a plurality of pressure sensors arranged on the supporting substrate, each being configured to output a signal in response to pressure applied thereto, a waterproof pouch surrounding the supporting substrate, and an analyzer configured to receive the signal from each of the plurality of pressure sensors and output in real time a pressure map on the supporting substrate based on the received signal. By using the pressure mapping apparatus and the method of cleaning a glass substrate by using the same according, an objective and quantitative test may be performed without a deviation between workers in a cleaning process, and thus, product defects such as particle defects are considerably reduced. |
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Bibliography: | Application Number: TW20187125163 |