Systems and methods for use in a lithographic apparatus

• Main Authors: HEMSCHOOTEIES VAAST PAUL, VALENTIN, CHRISTIAAN LOUIS, DONOSE, RADU, VAN DER MEULEN, FRITS, DE HOOGH, JOOST, LEROUX, ALAIN LOUIS CLAUDE, WIT, ROBERT COENRAAD, HUIJBERTS, ALEXANDER MARINUS ARNOLDUS, VAN SANTVOORT, JOHANNES FRANCISCUS MARTINUS
• Format: Patent
• Language: Chinese; English
• Published: 21.09.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BLASTING; CINEMATOGRAPHY; COLD ROOMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; COOLING OR FREEZING APPARATUS NOT COVERED BY ANY OTHERSUBCLASS; ELECTROGRAPHY; HEAT PUMP SYSTEMS; HEATING; HOLOGRAPHY; ICE-BOXES; LIGHTING; LIQUEFACTION SOLIDIFICATION OF GASES; MANUFACTURE OR STORAGE OF ICE; MATERIALS THEREFOR; MECHANICAL ENGINEERING; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; REFRIGERATION OR COOLING; REFRIGERATORS; WEAPONS

A system having a sub-system that is configured to change a thermal condition of a physical component from a set-point to a new set-point, wherein the sub-system includes: a mixer operative to receive a first conditioning fluid having a first temperature and a second conditioning fluid having a second temperature different from the first temperature, and operative to supply to the physical component a mix of the first conditioning fluid and the second conditioning fluid; and a controller configured to control the mixer in dependence on the new set-point. Also a method of operating a lithographic apparatus as well as a device manufactured using the system described herein or according to methods described herein.