Etching liquid composition and etching method

The problem to be solved by the present invention is to provide an etching liquid composition and an etching method using the same, wherein the etching liquid composition can selectively etch a molybdenum silicide film without damaging a quartz substrate. The present invention provides an etching li...

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Bibliographic Details
Main Authors SHIMIZU, TOSHIKAZU, OHWADA, TAKUO
Format Patent
LanguageChinese
English
Published 11.09.2023
Subjects
ADHESIVES
CHEMISTRY
DYES
MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
PAINTS
POLISHES
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Summary:The problem to be solved by the present invention is to provide an etching liquid composition and an etching method using the same, wherein the etching liquid composition can selectively etch a molybdenum silicide film without damaging a quartz substrate. The present invention provides an etching liquid composition for an etching treatment of a molybdenum silicide film, comprising: a fluorine compound of less than 3.5 wt%, water, and an iodine-containing oxidant.
Bibliography:Application Number: TW202211100976