TWI813941B
An objective of the present invention is to suppress degradation of formation precision of a pattern in a multi-model-on-glass (MMG) technology. An exposure apparatus for scanning and exposing a first pattern on a substrate includes: a mark formation unit for forming a plurality of alignment marks o...
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Main Authors | , , , |
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Format | Patent |
Language | Chinese |
Published |
01.09.2023
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Subjects | |
Online Access | Get full text |
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