TWI813941B

• Main Authors: TSUKAHARA, GO, ZHANG, QU, SHIBUYA, KYOHEI, SUZUKI, TOHRU
• Format: Patent
• Language: Chinese
• Published: 01.09.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

An objective of the present invention is to suppress degradation of formation precision of a pattern in a multi-model-on-glass (MMG) technology. An exposure apparatus for scanning and exposing a first pattern on a substrate includes: a mark formation unit for forming a plurality of alignment marks on the substrate; a first measurement unit for measuring positions of the alignment marks formed by the mark formation unit; and an output unit for outputting position information of the alignment mark measured by the first measurement unit so that the position information is used in another exposure apparatus that exposes a second pattern, wherein the mark formation unit is configured to: form a first mark group including at least two alignment marks in a first substrate position; form a second mark group including at least two alignment marks in a second substrate position where the substrate is moved in a direction including a component perpendicular to a straight line that connects the two alignment marks of the