Drawing apparatus

• Main Authors: FUKUDA, HIROSHI, HAYAKAWA, NAOTO, FUJITA, KATSUYA, HARA, NOZOMU
• Format: Patent
• Language: Chinese; English
• Published: 11.08.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

A first moving mechanism (22a) horizontally moves a first stage (21a) in a Y direction below a pattern drawing part (4). A second moving mechanism (22b) horizontally moves a second stage (21b) in the Y direction below the pattern drawing part (4). The second moving mechanism (22b) is disposed side by side with the first moving mechanism (22a) in an X direction. A frame (7) supports the first and second moving mechanisms (22a, 22b). A counterweight (51) is attached to the frame (7) so as to be movable in the X direction crossing a substrate moving direction. A weight movement control unit controls a weight moving mechanism (52) so as to dispose the counterweight (51) at a position where the deformation of the frame (7) caused by the weight of each of the first and second stages (21a, 21b) is suppressed on the basis of the positions of the first and second stages (21a, 21b) in the Y direction. Thus, drawing for a substrate (9) can be performed with good precision.