Drawing apparatus

A first moving mechanism (22a) horizontally moves a first stage (21a) in a Y direction below a pattern drawing part (4). A second moving mechanism (22b) horizontally moves a second stage (21b) in the Y direction below the pattern drawing part (4). The second moving mechanism (22b) is disposed side b...

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Bibliographic Details
Main Authors FUKUDA, HIROSHI, HAYAKAWA, NAOTO, FUJITA, KATSUYA, HARA, NOZOMU
Format Patent
LanguageChinese
English
Published 11.08.2023
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:A first moving mechanism (22a) horizontally moves a first stage (21a) in a Y direction below a pattern drawing part (4). A second moving mechanism (22b) horizontally moves a second stage (21b) in the Y direction below the pattern drawing part (4). The second moving mechanism (22b) is disposed side by side with the first moving mechanism (22a) in an X direction. A frame (7) supports the first and second moving mechanisms (22a, 22b). A counterweight (51) is attached to the frame (7) so as to be movable in the X direction crossing a substrate moving direction. A weight movement control unit controls a weight moving mechanism (52) so as to dispose the counterweight (51) at a position where the deformation of the frame (7) caused by the weight of each of the first and second stages (21a, 21b) is suppressed on the basis of the positions of the first and second stages (21a, 21b) in the Y direction. Thus, drawing for a substrate (9) can be performed with good precision.
Bibliography:Application Number: TW202110123244