TWI810335B

One embodiment of the present invention provides a detergent composition for resin mask removal, having excellent resin mask removal properties. This disclosure pertains to, in one embodiment, a detergent composition for resin mask removal, containing an alkali agent (component A), an organic solven...

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Bibliographic Details
Main Author YAMADA, KOUHEI
Format Patent
LanguageChinese
Published 01.08.2023
Subjects
ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CANDLES
CHEMISTRY
CINEMATOGRAPHY
DETERGENT COMPOSITIONS
DETERGENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
FATTY ACIDS THEREFROM
HOLOGRAPHY
MATERIALS THEREFOR
METALLURGY
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
RECOVERY OF GLYCEROL
RESIN SOAPS
SEMICONDUCTOR DEVICES
SOAP OR SOAP-MAKING
USE OF SINGLE SUBSTANCES AS DETERGENTS
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Summary:One embodiment of the present invention provides a detergent composition for resin mask removal, having excellent resin mask removal properties. This disclosure pertains to, in one embodiment, a detergent composition for resin mask removal, containing an alkali agent (component A), an organic solvent (component B) and water (component C), and wherein the coordinates of the Hansen solubility parameter of component B are within the range of a sphere having a diameter of 5.45 MPa0.5 and centering on δd=18.3, δp=6.8 and δh=3.7, and the content of component C during use falls within the range of 69.9% to 99.4% by mass, inclusive.
Bibliography:Application Number: TW20198125973