Alignment sensor apparatus for process sensitivity compensation

• Main Authors: TZEMAH, IRIT, GOORDEN, SEBASTIANUS ADRIANUS, MASON, CHRISTOPHER JOHN, ELAZHARY, TAMER MOHAMED TAWFIK AHMED MOHAMED, LIN, YUXIANG, KREUZER, JUSTIN LLOYD, HUISMAN, SIMON REINALD, SHOME, KRISHANU, TRAN, VU QUANG, AARTS, IGOR MATHEUS PETRONELLA
• Format: Patent
• Language: Chinese; English
• Published: 01.08.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

An alignment sensor apparatus includes an illumination system, a first optical system, a second optical system, a detector system, and a processor. The illumination system is configured to transmit an illumination beam along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target on a substrate. The second optical system includes a first polarizing optic configured to separate and transmit an irradiance distribution. The detector system is configured to measure a center of gravity of the diffraction target based on the irradiance distribution outputted from a first polarization branch and a second polarization branch. The processor is configured to measure a shift in the center of gravity of the diffraction target caused by an asymmetry variation in the diffraction target and determine a sensor response function of the alignment sensor apparatus based on the center of gravity shift.