Method, measuring system and lithography apparatus
A method for localizing an abnormality in a travel path of an optical component in or for a lithography apparatus includes: a) moving the optical component in at least one first degree of freedom; b) detecting a movement (Rz) of the optical component and/or a force acting on the optical component in...
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Main Authors | , |
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Format | Patent |
Language | Chinese English |
Published |
01.08.2023
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Subjects | |
Online Access | Get full text |
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Summary: | A method for localizing an abnormality in a travel path of an optical component in or for a lithography apparatus includes: a) moving the optical component in at least one first degree of freedom; b) detecting a movement (Rz) of the optical component and/or a force acting on the optical component in at least one second degree of freedom; and c) localizing the abnormality as a function of the movement detected in b) and/or the force detected in b). |
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Bibliography: | Application Number: TW20198113069 |