METHOD FOR PERFORMING SOURCE-MASK OPTIMIZATION BASED ON A DEFECT-BASED PROCESS WINDOW
A method including obtaining (i) measurements of a parameter of the feature, (ii) data related to a process variable of a patterning process, (iii) a functional behavior of the parameter defined as a function of the process variable based on the measurements of the parameter and the data related to...
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Main Authors | , , , , , , |
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Format | Patent |
Language | Chinese English |
Published |
11.07.2023
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Subjects | |
Online Access | Get full text |
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Summary: | A method including obtaining (i) measurements of a parameter of the feature, (ii) data related to a process variable of a patterning process, (iii) a functional behavior of the parameter defined as a function of the process variable based on the measurements of the parameter and the data related to the process variable, (iv) measurements of a failure rate of the feature, and (v) a probability density function of the process variable for a setting of the process variable, converting the probability density function of the process variable to a probability density function of the parameter based on a conversion function, where the conversion function is determined based on the function of the process variable, and determining a parameter limit of the parameter based on the probability density function of the parameter and the measurements of the failure rate. |
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Bibliography: | Application Number: TW202211100058 |