TWI807001B

A method of producing a pattern includes a step of forming a photocurable composition layer on a support, using a photocurable composition including a color material and a resin and having an acid value of a solid content of 1 to 25 mgKOH/g; a step of patternwise exposing the photocurable compositio...

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Bibliographic Details
Main Authors NAKAMURA, SHOICHI, OKAWARA, TAKAHIRO, NARA, YUKI, OSADA, SHUICHIRO
Format Patent
LanguageChinese
Published 01.07.2023
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:A method of producing a pattern includes a step of forming a photocurable composition layer on a support, using a photocurable composition including a color material and a resin and having an acid value of a solid content of 1 to 25 mgKOH/g; a step of patternwise exposing the photocurable composition layer; and a step of treating the photocurable composition layer in an unexposed area using a developer including an organic solvent, thereby performing development.
Bibliography:Application Number: TW20198110965