Polishing pad and method of forming the same

• Main Authors: REDEKER, FRED C, DAVENPORT, ROBERT E, ORILALL, MAHENDRA C, PATIBANDLA, NAG B, BAJAJ, RAJEEV, MENK, GREGORY E, FUNG, JASON G, KRISHNAN, KASIRAMAN, PERRY, RUSSELL EDWARD, REDFIELD, DANIEL
• Format: Patent
• Language: Chinese; English
• Published: 01.06.2023
• Subjects: BASIC ELECTRIC ELEMENTS; DRESSING OR CONDITIONING OF ABRADING SURFACES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS; GRINDING; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; PERFORMING OPERATIONS; POLISHING; SEMICONDUCTOR DEVICES; TRANSPORTING

Embodiments of the present disclosure relate to polymer precursor compositions for forming at least a portion of advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one resin precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regio