Pellicle for an euv reflective mask and a method of manufacturing thereof
A pellicle for an EUV photo mask includes a first layer; a second layer; and a main layer disposed between the first layer and second layer and including a plurality of nanotubes. At least one of the first layer or the second layer includes a two-dimensional material in which one or more two-dimensi...
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Main Authors | , , |
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Format | Patent |
Language | Chinese English |
Published |
01.06.2023
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Subjects | |
Online Access | Get full text |
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Summary: | A pellicle for an EUV photo mask includes a first layer; a second layer; and a main layer disposed between the first layer and second layer and including a plurality of nanotubes. At least one of the first layer or the second layer includes a two-dimensional material in which one or more two-dimensional layers are stacked. In one or more of the foregoing and following embodiments, the first layer includes a first two-dimensional material and the second layer includes a second two-dimensional material. |
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Bibliography: | Application Number: TW202211109289 |