Filters and facemasks having antimicrobial or antiviral properties

A filter or mask structure, comprising a first face layer comprising a polymer and having a face basis weight, a second outer layer comprising a polymer and having an outer basis weight less than 34 gsm, and a third outer layer comprising a polymer and having a third basis weight and disposed betwee...

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Bibliographic Details
Main Authors ORTEGA, Albert, Dean, Natasha, GOPAL, Vikram, YUNG, Wai-Shing
Format Patent
LanguageChinese
English
Published 01.04.2023
Subjects
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Summary:A filter or mask structure, comprising a first face layer comprising a polymer and having a face basis weight, a second outer layer comprising a polymer and having an outer basis weight less than 34 gsm, and a third outer layer comprising a polymer and having a third basis weight and disposed between the first face layer and the second outer layer. At least one of the layers further comprises an AM/AV compound. The mask structure demonstrates an Escherichia coli efficacy log reduction greater than 4.0, as measured in accordance with ASTM E3160 (2018) and a particulate filtration efficiency greater than 90%, as measured in accordance with ASTM F2299-03R17.
Bibliography:Application Number: TW202211108877