SUPPLY CONTROL SYSTEM FOR A PLURALITY OF TANKS
A supply control system for a tank utilized in a semiconductor manufacturing process is disclosed. The supply control system for the tank according to an embodiment of the present disclosure includes a plurality of tanks for storing a large amount of process material used to manufacture a semiconduc...
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Main Authors | , , , , , , , , , , , , , , |
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Format | Patent |
Language | Chinese English |
Published |
21.03.2023
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Subjects | |
Online Access | Get full text |
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Summary: | A supply control system for a tank utilized in a semiconductor manufacturing process is disclosed. The supply control system for the tank according to an embodiment of the present disclosure includes a plurality of tanks for storing a large amount of process material used to manufacture a semiconductor; a main-supply pipe configured to communicate with sub-supply pipes respectively coupled to the plurality of tanks and to supply process material to a semiconductor manufacturing device; a plurality of flow control devices respectively included in the sub-supply pipes and configured to control a process material flow rate discharged from each of the plurality of tanks; a sensor included in the main-supply pipe and configured to measure in real time the process material flow rate and a process material supply pressure supplied from each of the plurality of tanks to the semiconductor manufacturing device; a back-up portion coupled to the main-supply pipe and configured to supplementally discharge stored process m |
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Bibliography: | Application Number: TW202110134964 |