Cleaning tool and method for cleaning a portion of a lithography apparatus

The described system comprises a cleaning tool. The cleaning tool is configured to be inserted into a lithography apparatus. The cleaning tool includes a body configured to be inserted into the lithography apparatus; a cleaner material configured to clean a portion of the lithography apparatus upon...

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Bibliographic Details
Main Authors SLOAN, ERIC, RODAK, DANIEL PAUL, HARLALKA, AKSHAY
Format Patent
LanguageChinese
English
Published 11.02.2023
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The described system comprises a cleaning tool. The cleaning tool is configured to be inserted into a lithography apparatus. The cleaning tool includes a body configured to be inserted into the lithography apparatus; a cleaner material configured to clean a portion of the lithography apparatus upon contact therewith; and a film carrying the cleaner material, the film configured to attached to the body and prevent the cleaner material from contacting a surface of the body. The includes, for example, a first layer at least partially covered with the cleaner material, and a second layer configured to attach to the surface of the body and prevent the cleaner material from contacting the surface of the cleaning tool, the second layer being disposed between the first layer and the surface of the body.
Bibliography:Application Number: TW202110106873