Method and system for generating extreme ultraviolet (euv) light and related euv light source

An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the firs...

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Main Authors PURVIS, MICHAEL A, JUR, JORDAN, TAO, YEZHENG, ARCAND, JASON M, BROWN, DANIEL, SCHAFGANS, ALEXANDER A, STEWART IV, JOHN TOM, LAFORGE, ANDREW
Format Patent
LanguageChinese
English
Published 21.12.2022
Subjects
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
X-RAY TECHNIQUE
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Summary:An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.
Bibliography:Application Number: TW20209130651