PERIPHERAL PORTION COATING APPARATUS AND PERIPHERAL PORTION COATING METHOD

• Main Authors: MATSU, TAIJI, GOTO, SHIGEHIRO, HO, LINH DA, MABUCHI, YASUFUMI
• Format: Patent
• Language: Chinese; English
• Published: 01.12.2022
• Subjects: APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; APPARATUS SPECIALLY ADAPTED THEREFOR; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; SEMICONDUCTOR DEVICES; SPRAYING OR ATOMISING IN GENERAL; TRANSPORTING

The present invention relates to a peripheral part coating device and a peripheral part coating method. A substrate is held by a rotation holding part, so that the substrate is rotated about the central axis of the substrate. In a state in which the substrate is rotating, the coating liquid is supplied to the periphery of one surface of the substrate by a coating liquid supply part, whereby a coating film is formed on the periphery part except for the central area of one surface of the substrate. After the coating film is formed on the periphery part of one side of the substrate, a stirring operation by the rotation holding part is repeated two or more predetermined times. In each stirring operation, the substrate is accelerated to increase the rotational speed of the substrate. After acceleration of the substrate, the substrate is decelerated to decrease rotational speed of the substrate. After decelerating the substrate, the rotational speed of the substrate is maintained.