METHOD OF DETERMINING A VALUE OF A PARAMETER OF INTEREST OF A PATTERNING PROCESS, DEVICE MANUFACTURING METHOD

• Main Authors: WARNAAR, PATRICK, SMILDE, HENDRIK JAN HIDDE, HAJIAHMADI, MOHAMMADREZA, MACHT, LUKASZ JERZY, SOKOLOV, SERGEI, VAN DEN BOS, KAREL HENDRIK WOUTER, KUNNEMAN, LUCAS TIJN, BOS, HILKO DIRK
• Format: Patent
• Language: Chinese; English
• Published: 21.11.2022
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MATERIALS THEREFOR; MEASURING; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; TESTING

The disclosure relates to determining a value of a parameter of interest of a patterning process. A plurality of calibration data units is obtained from targets in a metrology process. Each of at least two of the calibration data units represents detected radiation obtained using different respective polarization settings in the metrology process, each polarization setting defining a polarization property of incident radiation of the metrology process and a polarization property of detected radiation of the metrology process. The calibration data units are used to obtain calibration information about the metrology process. A measurement data unit representing detected radiation scattered from a further target is obtained, the further target comprising a structure formed using the patterning process on the substrate or on a further substrate. The value of the parameter of interest is determined using the measurement data unit and the obtained calibration information.