TWI781144B
A photosensitive resin composition comprising the following component (a), component (b1), and component (b2). (a) a polyimide precursor having a structural unit represented by the following formula (1); (b1) one or more compounds selected from the group consisting of a compound represented by the f...
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Main Authors | , , |
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Format | Patent |
Language | Chinese |
Published |
21.10.2022
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Subjects | |
Online Access | Get full text |
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Abstract | A photosensitive resin composition comprising the following component (a), component (b1), and component (b2). (a) a polyimide precursor having a structural unit represented by the following formula (1); (b1) one or more compounds selected from the group consisting of a compound represented by the following formula (11) and a compound represented by the following formula (12); (b2) one or more compounds selected from the group consisting of a compound represented by the following formula (21) and a compound represented by the following formula (22). |
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AbstractList | A photosensitive resin composition comprising the following component (a), component (b1), and component (b2). (a) a polyimide precursor having a structural unit represented by the following formula (1); (b1) one or more compounds selected from the group consisting of a compound represented by the following formula (11) and a compound represented by the following formula (12); (b2) one or more compounds selected from the group consisting of a compound represented by the following formula (21) and a compound represented by the following formula (22). |
Author | SAITO, NOBUYUKI NAMATAME, YUTAKA KOIBUCHI, YUKARI |
Author_xml | – fullname: KOIBUCHI, YUKARI – fullname: NAMATAME, YUTAKA – fullname: SAITO, NOBUYUKI |
BookMark | eNrjYmDJy89L5WTgCgn3NLcwNDQxceJhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfEIDU7GRCgBALrNHTo |
ContentType | Patent |
DBID | EVB |
DatabaseName | esp@cenet |
DatabaseTitleList | |
Database_xml | – sequence: 1 dbid: EVB name: esp@cenet url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP sourceTypes: Open Access Repository |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Medicine Chemistry Sciences Physics |
ExternalDocumentID | TWI781144BB |
GroupedDBID | EVB |
ID | FETCH-epo_espacenet_TWI781144BB3 |
IEDL.DBID | EVB |
IngestDate | Fri Jul 19 13:04:10 EDT 2024 |
IsOpenAccess | true |
IsPeerReviewed | false |
IsScholarly | false |
Language | Chinese |
LinkModel | DirectLink |
MergedId | FETCHMERGED-epo_espacenet_TWI781144BB3 |
Notes | Application Number: TW20187106045 |
OpenAccessLink | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221021&DB=EPODOC&CC=TW&NR=I781144B |
ParticipantIDs | epo_espacenet_TWI781144BB |
PublicationCentury | 2000 |
PublicationDate | 20221021 |
PublicationDateYYYYMMDD | 2022-10-21 |
PublicationDate_xml | – month: 10 year: 2022 text: 20221021 day: 21 |
PublicationDecade | 2020 |
PublicationYear | 2022 |
RelatedCompanies | HD MICROSYSTEMS, LTD |
RelatedCompanies_xml | – name: HD MICROSYSTEMS, LTD |
Score | 3.5614443 |
Snippet | A photosensitive resin composition comprising the following component (a), component (b1), and component (b2). (a) a polyimide precursor having a structural... |
SourceID | epo |
SourceType | Open Access Repository |
SubjectTerms | ACYCLIC OR CARBOCYCLIC COMPOUNDS ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTED CIRCUITS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP |
Title | TWI781144B |
URI | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221021&DB=EPODOC&locale=&CC=TW&NR=I781144B |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwY2BQSTZNMTNPNTHUTQLW_romwDpUNzE12VQ32dTYLC0Z2GFJAh9W7etn5hFq4hVhGsHEkAHbCwM-J7QcfDgiMEclA_N7Cbi8LkAMYrmA11YW6ydlAoXy7d1CbF3UoL1jI1AHxlDNxcnWNcDfxd9ZzdnZNiRczS_I1hO0o9LExImZgRXUiAadsu8a5gTak1KAXKG4CTKwBQDNyisRYmCqyhBm4HSG3bsmzMDhC53uFmZgB6_PTC4GCkLzYLEIA1dIOMwaUQYFN9cQZw9doPHxcJ_EIxQ4GYsxsAA7-KkSDAoGacnJlqlGaeaGacC6Iik5MSk11SLR1DDRHBhQyanGkgySOI2RwiMnzcAFChJQSWtkKMPAUlJUmioLrEJLkuTAvgcAvydzyQ |
link.rule.ids | 230,309,786,891,25594,76906 |
linkProvider | European Patent Office |
linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1LT8MwDLbGgG03KCDGcwfUWwV9w6FCarqqg7WbUGG7VU2WalzYRIuQ-PU4Ucu4wNWJHMWS_eVLbAfgitkLx-WWrlFEf81CDNVyzmyN2aZTMCQsVDarjhMnerYe5va8BcumFkb2Cf2UzRHRoxj6eyXj9XpziRXI3Mrymr6iaHUfpl6g1uzYEARGVwPfG04nwYSohHjpTE2evJGoqLQsfwu2XdGbVxycXnxRk7L-DSjhHuxMUddbtQ-tr6UCXdL8u6ZAJ66fuxXYlfmZrERh7YPlAfTSWbPMIQzCYUoiDdVnPzvJNhN88wjaSPD5MQxuCsbuuFG4eoFYQVlOOb_NbT130VCMm33o_6nm5J-xS-hGaTzOxqPk8RR6wjwi6hr6GbSr9w9-jnBa0QtpiW9RRHa2 |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=TWI781144B&rft.inventor=KOIBUCHI%2C+YUKARI&rft.inventor=NAMATAME%2C+YUTAKA&rft.inventor=SAITO%2C+NOBUYUKI&rft.date=2022-10-21&rft.externalDBID=B&rft.externalDocID=TWI781144BB |