Method, computer program product, semiconductor inspection device of obtaining a 3d volume image of an integrated semiconductor sample
A three-dimensional circuit pattern inspection technique includes cross sectioning integrated circuits for obtaining a 3D volume image of an integrated semiconductor sample. The method employs a feature based alignment of cross section images based on features of an integrated semiconductor sample....
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Main Authors | , , , , , , , |
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Format | Patent |
Language | Chinese English |
Published |
01.09.2022
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Subjects | |
Online Access | Get full text |
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Summary: | A three-dimensional circuit pattern inspection technique includes cross sectioning integrated circuits for obtaining a 3D volume image of an integrated semiconductor sample. The method employs a feature based alignment of cross section images based on features of an integrated semiconductor sample. A computer program product and apparatus are provided. |
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Bibliography: | Application Number: TW20209118306 |