Method of optimising measurement data from a sensor system and method for monitoring condition of semiconductor manufacturing process

A method for determining one or more optimized values of an operational parameter of a sensor system configured for measuring a property of a substrate is disclosed the method comprising: determining a quality parameter for a plurality of substrates; determining measurement parameters for the plural...

Full description

Saved in:
Bibliographic Details
Main Authors COX, MATTHIJS, ERDAMAR, AHMET KORAY, CEKLI, HAKKI ERGUN, BIJNEN, FRANCISCUS GODEFRIDUS CASPER, HULSEBOS, EDO MARIA, VU, TRAN THANH THUY, VAN DE VEN, WENDY JOHANNA MARTINA, TINNEMANS, PATRICIUS ALOYSIUS JACOBUS, VERHEES, LOEK JOHANNES PETRUS, ROELOFS, WILLEM SEINE CHRISTIAN, BRINKHOF, RALPH, MEGENS, HENRICUS JOHANNES LAMBERTUS, VAN T WESTEINDE, MAAIKE, YAGUBIZADE, HADI, GOOSEN, MAIKEL ROBERT, RIJPSTRA, MANOUK, KOU, WEITIAN
Format Patent
LanguageChinese
English
Published 11.08.2022
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Online AccessGet full text

Cover

More Information
Summary:A method for determining one or more optimized values of an operational parameter of a sensor system configured for measuring a property of a substrate is disclosed the method comprising: determining a quality parameter for a plurality of substrates; determining measurement parameters for the plurality of substrates obtained using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameters; and determining the one or more optimized values of the operational parameter based on the comparing.
Bibliography:Application Number: TW20209125511