SYSTEM AND METHOD FOR DEEP ULTRAVIOLET (DUV) OPTICAL LITHOGRAPHY, METHOD OF CONTROLLING AN OPTICAL SOURCE APPARATUS, AND CONTROL MODULE FOR AN OPTICAL SOURCE APPARATUS
A system for deep ultraviolet (DUV) optical lithography includes an optical source apparatus including N optical oscillators, N being an integer number greater than or equal to two, and each of the N optical oscillators is configured to produce a pulse of light in response to an excitation signal; a...
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Main Authors | , |
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Format | Patent |
Language | Chinese English |
Published |
01.08.2022
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Subjects | |
Online Access | Get full text |
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Summary: | A system for deep ultraviolet (DUV) optical lithography includes an optical source apparatus including N optical oscillators, N being an integer number greater than or equal to two, and each of the N optical oscillators is configured to produce a pulse of light in response to an excitation signal; and a control system coupled to the optical source apparatus. The control system is configured to determine a corrected excitation signal for a first one of the N optical oscillators based on an input signal, the input signal including an energy property of a pulse of light produced by another one of the N optical oscillators. |
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Bibliography: | Application Number: TW20209144398 |