METHODS FOR PROTECTING A SUBSTRATE HOLDER AND APPARATUSES FOR MANUFACTURING DEVICES

The present invention relates to methods for reducing wafer load grid and flatness degradation of a substrate holder, such as a wafertable, of a lithographic apparatus. The present invention also relates to systems comprising lithography substrate holders, such as wafertables, with improved resistan...

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Main Authors VAN KUILENBURG, JULIEN, TROMP, SIEGFRIED ALEXANDER, VAN HAL, PAULUS ALBERTUS, STEVENS, LUCAS HENRICUS JOHANNES, BECKERS, JOHAN FRANCISCUS MARIA, STEL, BART WILLEM, KOEVOETS, ADRIANUS HENDRIK, ACHANTA, SATISH, DAVIES, DYLAN JOHN DAVID, SEOANE DE LA CUESTA, BEATRIZ
Format Patent
LanguageChinese
English
Published 11.07.2022
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The present invention relates to methods for reducing wafer load grid and flatness degradation of a substrate holder, such as a wafertable, of a lithographic apparatus. The present invention also relates to systems comprising lithography substrate holders, such as wafertables, with improved resistance to wafer load grid and flatness degradation, and to methods of fabricating devices, e.g. integrated circuits, using such systems. The present invention also relates to substrates, such as wafers, with backsides configured to protect substrate holders, such as wafertables, from wafer load grid and flatness degradation when used in lithography, and to methods of removing hydrophobic coatings from such substrates, such as wafers. The present invention has particular use in connection with lithographic apparatus for fabricating devices, for example integrated circuits.
Bibliography:Application Number: TW20209144632