Photocathode system, wafer inspection method, and wafer inspection tool
The system includes a photocathode electron source, diffractive optical element, and a microlens array to focus the beamlets. A source directs a radiation beam to the diffractive optical element, which produces a beamlet array to be used in combination with a photocathode surface to generate an arra...
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Main Authors | , , , , , , |
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Format | Patent |
Language | Chinese English |
Published |
21.06.2022
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Subjects | |
Online Access | Get full text |
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Summary: | The system includes a photocathode electron source, diffractive optical element, and a microlens array to focus the beamlets. A source directs a radiation beam to the diffractive optical element, which produces a beamlet array to be used in combination with a photocathode surface to generate an array of electron beams from the beamlets. |
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Bibliography: | Application Number: TW20198104590 |