Photocathode system, wafer inspection method, and wafer inspection tool

The system includes a photocathode electron source, diffractive optical element, and a microlens array to focus the beamlets. A source directs a radiation beam to the diffractive optical element, which produces a beamlet array to be used in combination with a photocathode surface to generate an arra...

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Bibliographic Details
Main Authors ROMERO, MICHAEL E, GARCIA, RUDY, DELGADO, GILDARDO R, IOAKEIMIDI, KATERINA, MARKS, ZEFRAM, HILL, FRANCES A, LOPEZ, GARY V
Format Patent
LanguageChinese
English
Published 21.06.2022
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Summary:The system includes a photocathode electron source, diffractive optical element, and a microlens array to focus the beamlets. A source directs a radiation beam to the diffractive optical element, which produces a beamlet array to be used in combination with a photocathode surface to generate an array of electron beams from the beamlets.
Bibliography:Application Number: TW20198104590