Method, apparatus and recording medium for hotspot prediction

A method, an apparatus and a recording medium for hotspot prediction are provided. The method includes following steps: retrieving a layout pattern, and extracting a plurality of regional patterns from the layout pattern; defining a source map of a source used in a photolithography process for the l...

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Bibliographic Details
Main Authors LAI, CHING-HUNG, HUANG, CHIHUNG
Format Patent
LanguageChinese
English
Published 21.05.2022
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A method, an apparatus and a recording medium for hotspot prediction are provided. The method includes following steps: retrieving a layout pattern, and extracting a plurality of regional patterns from the layout pattern; defining a source map of a source used in a photolithography process for the layout pattern; and analysing a correlation between each of the regional patterns and the source map by using a pattern classification algorithm, and predicting a hotspot in the regional patterns.
Bibliography:Application Number: TW20209120503