COMPOUND, COLORANT COMPOSITION, PHOTORESIST, COLOR FILTER AND DISPLAY DEVICE

• Main Authors: LEE, DAMI, YANG, SEUNG JIN, KIM, HYE JIN, KIM, JI SUN, LEE, JAE YONG, KIM, HAN SOO, KIM, YOUNGWOONG
• Format: Patent
• Language: Chinese; English
• Published: 11.05.2022
• Subjects: ADHESIVES; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; CINEMATOGRAPHY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; CORRECTING FLUIDS; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; DYES; ELECTROGRAPHY; FILLING PASTES; FREQUENCY-CHANGING; HOLOGRAPHY; INKS; LAKES; MATERIALS THEREFOR; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; MORDANTS; NATURAL RESINS; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICAL LOGIC ELEMENTS; OPTICS; ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES; ORIGINALS THEREFOR; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; POLISHES; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; USE OF MATERIALS THEREFOR; WOODSTAINS

The present specification provides a compound, a colorant composition, a photosensitive material, a color filter, and a display device, wherein the compound contains a triarylmethane dye monomer, a (meth)acrylic acid monomer, and a structure represented by chemical formula 1.