Method of adjusting signal to noise ratio of sram and invertor structure
An inverter structure includes a first fin structure disposed within a P-type transistor region on a substrate. A second fin structure is disposed within an N-type transistor region on the substrate. A gate line is disposed within the P-type transistor region and the N-type transistor region. A firs...
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Main Authors | , , , , , , , , |
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Format | Patent |
Language | Chinese English |
Published |
21.04.2022
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Subjects | |
Online Access | Get full text |
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Summary: | An inverter structure includes a first fin structure disposed within a P-type transistor region on a substrate. A second fin structure is disposed within an N-type transistor region on the substrate. A gate line is disposed within the P-type transistor region and the N-type transistor region. A first end of the gate line is within the P-type transistor region, and a second end of the gate line is within the N-type transistor region. Two dummy gate lines are respectively disposed at two sides of the gate line. Each dummy gate line has a third end within the P-type transistor region, and a fourth end within the N-type transistor region. A first distance between the first end and the first fin structure is greater than a third end between the third end and the first fin structure. The second distance between the second end and the second fin structure is smaller than a fourth distance between the fourth end and the second fin structure. |
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Bibliography: | Application Number: TW202110136985 |