METHODS FOR FORMING SEMICONDUCTOR DEVICES

A photo resist layer is used to protect a dielectric layer and conductive elements embedded in the dielectric layer when patterning an etch stop layer underlying the dielectric layer. The photo resist layer may further be used to etch another dielectric layer underlying the etch stop layer, where et...

Full description

Saved in:
Bibliographic Details
Main Authors CHIU, U-TING, YEH, MING-HSI, WANG, YU-SHIH, LEE, CHIA-YING, YEH, PO-NAN, LIN, CHUN-NENG, YANG, HONG-JIE, HUANG, KUO-BIN
Format Patent
LanguageChinese
English
Published 21.04.2022
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:A photo resist layer is used to protect a dielectric layer and conductive elements embedded in the dielectric layer when patterning an etch stop layer underlying the dielectric layer. The photo resist layer may further be used to etch another dielectric layer underlying the etch stop layer, where etching the next dielectric layer exposes a contact, such as a gate contact. The bottom layer can be used to protect the conductive elements embedded in the dielectric layer from a wet etchant used to etch the etch stop layer.
Bibliography:Application Number: TW20209146195