Projection exposure method and projection exposure apparatus for microlithography
A projection exposure method and apparatus are disclosed for exposing a radiation-sensitive substrate with at least one image of a pattern of a mask under the control of an operating control system of a projection exposure apparatus, part of the pattern lying in an illumination region is imaged onto...
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Main Author | |
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Format | Patent |
Language | Chinese English |
Published |
01.04.2022
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Subjects | |
Online Access | Get full text |
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Summary: | A projection exposure method and apparatus are disclosed for exposing a radiation-sensitive substrate with at least one image of a pattern of a mask under the control of an operating control system of a projection exposure apparatus, part of the pattern lying in an illumination region is imaged onto the image field on the substrate with the aid of a projection lens, wherein all rays of the projection radiation contributing to the image generation in the image field form a projection beam path. |
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Bibliography: | Application Number: TW20187118733 |