Silicon oxide preparation device
A silicon oxide preparation device includes a heating furnace, a heating device, a crucible, a deposition box, at least one exhaust pipe, and an exhaust device. The crucible and the deposition box are set in the heating furnace, and the heating The device heats the crucible so that the solid raw mat...
Saved in:
Main Authors | , , |
---|---|
Format | Patent |
Language | Chinese English |
Published |
21.03.2022
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | A silicon oxide preparation device includes a heating furnace, a heating device, a crucible, a deposition box, at least one exhaust pipe, and an exhaust device. The crucible and the deposition box are set in the heating furnace, and the heating The device heats the crucible so that the solid raw material contained in the crucible forms a gaseous silicon oxide. The deposition box has at least one gas inlet and one gas outlet, and at least one adsorbent is arranged inside the deposition box; The first end of the at least one exhaust pipe is arranged at a position adjacent to the opening on the crucible, the second end of the at least one exhaust pipe is communicated with at least one air inlet of the deposition box; The air exhaust device communicates with the air outlet of the deposition box to extract the gaseous silicon oxide from the crucible and contact the gaseous silicon oxide with the surface of the at least one adsorbent to deposit a solid silicon oxide. |
---|---|
Bibliography: | Application Number: TW202110118079 |