Method to produce a semiconductor wafer for versatile products
Aspects of the disclosure provide a method for semiconductor wafer manufacturing. The method includes utilizing a subset of lower level masks in a mask set to form multiple modular units of lower level circuit structures on a semiconductor wafer. The mask set includes the subset of lower level masks...
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Main Authors | , , |
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Format | Patent |
Language | Chinese English |
Published |
11.03.2021
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Subjects | |
Online Access | Get full text |
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Summary: | Aspects of the disclosure provide a method for semiconductor wafer manufacturing. The method includes utilizing a subset of lower level masks in a mask set to form multiple modular units of lower level circuit structures on a semiconductor wafer. The mask set includes the subset of lower level masks and at least a first subset of upper level masks and a second subset of upper level masks. The first subset of upper level masks defines intra-unit interconnections. The second subset of upper level masks defines both intra-unit interconnections and inter-unit interconnections. The method further includes selecting one of at least the first subset of upper level masks and the second subset of upper level masks based on a composition request of a final integrated circuit (IC) product and utilizing the selected subset of upper level masks to form upper level structures on the semiconductor wafer. |
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Bibliography: | Application Number: TW20165136152 |