Method of optimizing a metrology process

• Main Authors: KONTOROUPI, THALEIA, REHMAN, SAMEE UR, ZAAL, MARTIJN MARIA, TSIATMAS, ANAGNOSTIS, FAGGINGER AUER, BASTIAAN ONNE, VENSELAAR, JOANNES JITSE, MEDVEDYEVA, MARIYA VYACHESLAVIVNA
• Format: Patent
• Language: Chinese; English
• Published: 11.12.2020
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

Method of optimizing a metrology process are disclosed. In one arrangement, measurement data from a plurality of applications of the metrology process to a first target on a substrate are obtained. Each application of the metrology process comprises illuminating the first target with a radiation spo...