Method of optimizing a metrology process

Method of optimizing a metrology process are disclosed. In one arrangement, measurement data from a plurality of applications of the metrology process to a first target on a substrate are obtained. Each application of the metrology process comprises illuminating the first target with a radiation spo...

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Bibliographic Details
Main Authors KONTOROUPI, THALEIA, REHMAN, SAMEE UR, ZAAL, MARTIJN MARIA, TSIATMAS, ANAGNOSTIS, FAGGINGER AUER, BASTIAAN ONNE, VENSELAAR, JOANNES JITSE, MEDVEDYEVA, MARIYA VYACHESLAVIVNA
Format Patent
LanguageChinese
English
Published 11.12.2020
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:Method of optimizing a metrology process are disclosed. In one arrangement, measurement data from a plurality of applications of the metrology process to a first target on a substrate are obtained. Each application of the metrology process comprises illuminating the first target with a radiation spot and detecting radiation redirected by the first target. The applications of the metrology process include applications at either or both of a) plural positions of the radiation spot relative to the first target, and b) plural focus heights of the radiation spot. The measurement data comprises, for each application of the metrology process, a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method comprises determining either or both of an optimal alignment and an optimal focus height based on comparisons between the detected pupil representations in the measurement data and a reference pupil representation.
Bibliography:Application Number: TW20190103044