Method of manufacturing semiconductor device, and semiconductor device
A production method for a semiconductor device, the production method including: a preparation step for preparing a semiconductor wafer that has a circuit formed on a principal surface thereof; an attachment step for attaching the semiconductor wafer to an adhesive layer; a first division step for o...
Saved in:
Main Author | |
---|---|
Format | Patent |
Language | Chinese English |
Published |
11.11.2020
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | A production method for a semiconductor device, the production method including: a preparation step for preparing a semiconductor wafer that has a circuit formed on a principal surface thereof; an attachment step for attaching the semiconductor wafer to an adhesive layer; a first division step for obtaining a plurality of semiconductor chips by dividing, in accordance with dicing regions, the semiconductor wafer that has been attached to the adhesive layer; a sealing step for collectively sealing the plurality of semiconductor chips, which have the principal surface thereof attached to the adhesive layer, such that a sealing material layer that comprises a semiconductor sealing resin composition is formed in the intervals between the side surfaces of the semiconductor chips and on the rear surface of the semiconductor chips; and a second division step for obtaining a plurality of semiconductor chips that have the sealing material layer formed on the side surfaces and rear surface thereof by dividing the seali |
---|---|
Bibliography: | Application Number: TW20154127817 |