TWI703039B

The invention provides a functional film that has a desired microrelief pattern structure, that sufficiently exerts characteristics of a resin serving as a main component for imparting functions to the functional film, and that has an excellent antifouling property, water-repellency, and oil-repelle...

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Bibliographic Details
Main Authors SAKAKURA, ATSUSHI, SAKAMOTO, EIJI, YAMASHITA, TSUNEO, NII, SAYA
Format Patent
LanguageChinese
Published 01.09.2020
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Summary:The invention provides a functional film that has a desired microrelief pattern structure, that sufficiently exerts characteristics of a resin serving as a main component for imparting functions to the functional film, and that has an excellent antifouling property, water-repellency, and oil-repellency. The functional film includes a layer (A) that contains a resin and a layer (B) that contains a compound containing a perfluoropolyether group. The layer (B) has a microrelief pattern structure on a surface remote from the layer (A) . In elemental analysis by X-ray photoelectron spectroscopy with etching by an argon gas cluster ion beam from the layer (B) side, the functional film satisfies the following formula (1): D1 < 2 × X1, wherein X1 is a thickness (nm) of the layer (B); and D1 is a depth (nm) at which fluorine atoms exhibit a concentration of 1 atom% or lower. In carbon 1s spectrum measurement by X-ray photoelectron spectroscopy with etching by an argon gas cluster ion beam from the layer (B) side, the
Bibliography:Application Number: TW20176136646