Substrate-processing device
Provided is a substrate-processing device capable of preventing a top lid from sagging downward by the own weight of the substrate-processing device and/or a vacuum suction force generated by a vacuum pump and/or thermal shock at high temperature process, in a chamber including a plurality of reacto...
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Main Authors | , , |
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Format | Patent |
Language | Chinese English |
Published |
21.11.2019
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Subjects | |
Online Access | Get full text |
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Summary: | Provided is a substrate-processing device capable of preventing a top lid from sagging downward by the own weight of the substrate-processing device and/or a vacuum suction force generated by a vacuum pump and/or thermal shock at high temperature process, in a chamber including a plurality of reactors. Also, provided is a rotating shaft for transferring a substrate between the plurality of reactors. |
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Bibliography: | Application Number: TW20187125586 |