Drawing method

A height information Dh is acquired (step S205), which represents the height of each of a plurality of alignment marks AM (reference points) provided in a chip region Rc, and, from the height information Dh, a value representing the slope in the chip region Rc (alignment mark AM height difference ΔH...

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Bibliographic Details
Main Author NAKAI, KAZUHIRO
Format Patent
LanguageChinese
English
Published 11.10.2019
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A height information Dh is acquired (step S205), which represents the height of each of a plurality of alignment marks AM (reference points) provided in a chip region Rc, and, from the height information Dh, a value representing the slope in the chip region Rc (alignment mark AM height difference ΔH) is calculated (step S206). Then, whether executing drawing in the chip region Rc is appropriate or not is determined based on the focal depth and the result of the calculation of the value ΔH representing the slope in the drawing region (step S208).
Bibliography:Application Number: TW20154101588