Silicon deposition reactor with bottom seal arrangement

• Main Authors: MILLER, MATTHEW J, SPANGLER, MICHAEL V, HANSEN, JEFFREY A
• Format: Patent
• Language: Chinese; English
• Published: 11.09.2019
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

Fluidized bed reactor systems for producing high purity silicon-coated particles are disclosed. A vessel has an outer shell, an insulation layer inwardly of the outer shell, a concentric inner shell inwardly of the outer shell, and a concentric liner that is positioned inwardly of the inner shell and that defines a reactor chamber. The inner shell and liner are sealed together at their bottoms by an O-ring seal arrangement to prevent gas in the reactor chamber from entering a space between the inner shell and the liner. A central inlet nozzle produces a vertical gas plume in the reactor chamber.