TWI663122B

The present invention provides an optical film, an optical film assembly, and a method of manufacturing the same. The material of the optical film is silicon nitride, and the following conditions (I) to (III) are satisfied: (I) the density of the optical film is in a range of 2.7 to 4.2 g.cm<-3&g...

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Bibliographic Details
Main Authors LIAO, BO-HUI, ZHAN, SHI-HAO, CHEN, SHENG-HUI, ZENG, SHAO-ZE
Format Patent
LanguageChinese
Published 21.06.2019
Subjects
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
COMPOUNDS THEREOF
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
INORGANIC CHEMISTRY
LAYERED PRODUCTS
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
METALLURGY
NON-METALLIC ELEMENTS
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PERFORMING OPERATIONS
PHYSICS
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
TRANSPORTING
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Summary:The present invention provides an optical film, an optical film assembly, and a method of manufacturing the same. The material of the optical film is silicon nitride, and the following conditions (I) to (III) are satisfied: (I) the density of the optical film is in a range of 2.7 to 4.2 g.cm<-3>; (II) the refractive index of the optical film is in a range of 1.6 to 2.1; and (III) the hardness of the optical film is in a range of 18 GPa to 30 GPa. In addition, the extinction coefficient of the optical film is in a range of 1x10<-4> to 1x10<-3>.
Bibliography:Application Number: TW20170127096