Sub 200nm laser pumped homonuclear excimer lasers

Disclosed are methods and apparatus for generating a sub-200 nm continuous wave (cw) laser. A laser apparatus includes a chamber for receiving at least a rare gas or rare gas mixtures and a pump laser source for generating at least one cw pump laser focused in the chamber for generating at least one...

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Bibliographic Details
Main Authors BEZEL, ILYA, SHELININ, ANATOLY, SOLARZ, RICHARD W
Format Patent
LanguageChinese
English
Published 01.12.2018
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
DEVICES USING STIMULATED EMISSION
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MATERIALS THEREFOR
MEASURING
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
TESTING
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Summary:Disclosed are methods and apparatus for generating a sub-200 nm continuous wave (cw) laser. A laser apparatus includes a chamber for receiving at least a rare gas or rare gas mixtures and a pump laser source for generating at least one cw pump laser focused in the chamber for generating at least one laser-sustained plasma in the chamber. The laser apparatus further includes a system for forming an optical cavity in which the at least one laser-sustained plasma serves as an excitation source for producing at least one cw laser having a wavelength that is below about 200 nm. In one aspect, the at least one laser-sustained plasma has a shape that substantially matches a shape of the optical cavity.
Bibliography:Application Number: TW20143144154