A fluid handling structure and lithographic apparatus

• Main Authors: SPRUYTENBURG, PATRICK JOHANNES WILHELMUS, OLIESLAGERS, RUUD, MELMAN, JOHANNES CORNELIS PAULUS, YU, MIAO, LEMPENS, HAN HENRICUS ALDEGONDA, ULUCAN, ARTUNC, GATTOBIGIO, GIOVANNI LUCA, ROPS, CORNELIUS MARIA, POLET, THEODORUS WILHELMUS, EUMMELEN, ERIK HENRICUS EGIDIUS CATHARINA
• Format: Patent
• Language: Chinese; English
• Published: 21.11.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BLASTING; CINEMATOGRAPHY; ELECTROGRAPHY; FLUID-CIRCUIT ELEMENTS PREDOMINANTLY USED FOR COMPUTING ORCONTROL PURPOSES; FLUID-PRESSURE ACTUATORS; HEATING; HOLOGRAPHY; HYDRAULICS OR PNEUMATICS IN GENERAL; LIGHTING; MATERIALS THEREFOR; MECHANICAL ENGINEERING; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; WEAPONS

An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards o...