A fluid handling structure and lithographic apparatus

• Main Authors: SPRUYTENBURG, PATRICK JOHANNES WILHELMUS, OLIESLAGERS, RUUD, MELMAN, JOHANNES CORNELIS PAULUS, YU, MIAO, LEMPENS, HAN HENRICUS ALDEGONDA, ULUCAN, ARTUNC, GATTOBIGIO, GIOVANNI LUCA, ROPS, CORNELIUS MARIA, POLET, THEODORUS WILHELMUS, EUMMELEN, ERIK HENRICUS EGIDIUS CATHARINA
• Format: Patent
• Language: Chinese; English
• Published: 21.11.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BLASTING; CINEMATOGRAPHY; ELECTROGRAPHY; FLUID-CIRCUIT ELEMENTS PREDOMINANTLY USED FOR COMPUTING ORCONTROL PURPOSES; FLUID-PRESSURE ACTUATORS; HEATING; HOLOGRAPHY; HYDRAULICS OR PNEUMATICS IN GENERAL; LIGHTING; MATERIALS THEREFOR; MECHANICAL ENGINEERING; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; WEAPONS

An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.