Displacement detection method, displacement detection apparatus, drawing apparatus and substrate inspection apparatus

• Main Author: NAKAI, KAZUHIRO
• Format: Patent
• Language: Chinese; English
• Published: 11.10.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MATERIALS THEREFOR; MEASURING; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; TESTING

The present invention addresses the issues of: providing a position displacement detection technology capable of accurately finding the amount of rotational position displacement in a reference direction for the surface of a substrate that is positioned such that a cut-out section provided on an outer circumferential section thereof faces the reference direction; and performing highly accurate drawing and precise substrate inspections by using said position displacement detection technology. [Solution] A position displacement detection method comprising: a first step in which a partial image of the surface of a substrate is obtained; a second step in which a plurality of patterns included in the partial image are obtained; a third step in which a plurality of pattern pairs are selected from the plurality of patterns and a plurality of equal-pitch pairs having an equal distance between patterns among the plurality of pattern pairs are found; a fourth step in which a rotation angle for two patterns relative to