Organic layer composition and method of forming patterns

• Main Authors: LEE, CHUNGHEON, PARK, YOUJUNG, KWON, HYO YOUNG, BAE, SHINHYO, JANG, HYEJIN, PARK, YUSHIN, LEE, HYUNSOO, KIM, TAEHO
• Format: Patent
• Language: Chinese; English
• Published: 01.09.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP

The present invention relates to an organic film composition containing a polymer comprising a structural unit represented by chemical formula 1, a monomer represented by chemical formula 2, and a solvent; and to a pattern forming method using the organic film composition. The definitions of chemical formulas 1 and 2 are as described in the specification.