Method of treating a gas with a gas treatment apparatus

Method of treating gas and gas treatment device, the gas treatment device comprising: a first chamber, comprising a first inlet, a first outlet and a first energy supply system, allowing the gas to enter the first chamber through the first inlet; a second chamber comprising a second outlet and a sec...

Full description

Saved in:
Bibliographic Details
Main Authors CHEN, TSUI MIN, LI, TA CHING
Format Patent
LanguageChinese
English
Published 01.09.2018
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:Method of treating gas and gas treatment device, the gas treatment device comprising: a first chamber, comprising a first inlet, a first outlet and a first energy supply system, allowing the gas to enter the first chamber through the first inlet; a second chamber comprising a second outlet and a second energy supply system; a third chamber comprising a third inlet in communication with the first outlet and the second outlet; and a fourth chamber comprising a fourth inlet and a scrubbing system containing a solvent comprising water molecules (H2O), wherein the third outlet of the third chamber is in communication with the fourth inlet of the fourth chamber.
Bibliography:Application Number: TW20160114815