Method of treating a gas with a gas treatment apparatus
Method of treating gas and gas treatment device, the gas treatment device comprising: a first chamber, comprising a first inlet, a first outlet and a first energy supply system, allowing the gas to enter the first chamber through the first inlet; a second chamber comprising a second outlet and a sec...
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Main Authors | , |
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Format | Patent |
Language | Chinese English |
Published |
01.09.2018
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Subjects | |
Online Access | Get full text |
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Summary: | Method of treating gas and gas treatment device, the gas treatment device comprising: a first chamber, comprising a first inlet, a first outlet and a first energy supply system, allowing the gas to enter the first chamber through the first inlet; a second chamber comprising a second outlet and a second energy supply system; a third chamber comprising a third inlet in communication with the first outlet and the second outlet; and a fourth chamber comprising a fourth inlet and a scrubbing system containing a solvent comprising water molecules (H2O), wherein the third outlet of the third chamber is in communication with the fourth inlet of the fourth chamber. |
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Bibliography: | Application Number: TW20160114815 |