Etchant composition for metal layer, method for etching copper-based metal layer using the same, method for preparing array substrate for liquid crystal display device, array substrate for liquid crystal display device prepared therefrom

• Main Authors: YOON, YOUNG JIN, KUK, IN SEOL, KWON, MIN JEONG
• Format: Patent
• Language: Chinese; English
• Published: 11.08.2018
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; DIFFUSION TREATMENT OF METALLIC MATERIAL; FREQUENCY-CHANGING; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25; NON-LINEAR OPTICS; NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; PHYSICS; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

The present invention provides a metal film etchant composition comprising: (a) phosphoric acid; (b) nitric acid; (c) acetic acid; (d) fluorine compound; (e) sulfuric acid compound; and (f) water, wherein the (e) sulfuric acid compound has a pKa value of -1 to 5.