An apparatus for shielding a reticle for lithography, a method for shielding a reticle of a lithography apparatus, a reticle assembly for lithography, and a pellicle assembly

The present invention is concerned with an apparatus for shielding a reticle for EUV lithography. The apparatus comprises a pellicle, and at least one actuator in communication with the pellicle, the actuator being configured to induce, in use, movement of the pellicle with respect to a reticle.

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Bibliographic Details
Main Authors DHALLUIN, FLORIAN DIDIER ALBIN, ARIAS ESPINOZA, JUAN DIEGO, BROUNS, DERK SERVATIUS GERTRUDA, WILEY, JAMES NORMAN, RIZO DIAGO, PEDRO JULIAN, SCACCABAROZZI, LUIGI, DE WINTER, LAURENTIUS CORNELIUS
Format Patent
LanguageChinese
English
Published 21.04.2018
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The present invention is concerned with an apparatus for shielding a reticle for EUV lithography. The apparatus comprises a pellicle, and at least one actuator in communication with the pellicle, the actuator being configured to induce, in use, movement of the pellicle with respect to a reticle.
Bibliography:Application Number: TW20143110765