Mounting stage and plasma processing device

• Main Authors: TOMIOKA, TAKETOSHI, GOHIRA, TAKU, MAKABE, TOSHIYUKI
• Format: Patent
• Language: Chinese; English
• Published: 11.04.2018
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To suppress the unevenness of temperature in a central region and an end region of an object to be processed.SOLUTION: A mounting table comprises: a base portion in which a flow passage for refrigerant is formed; and an electrostatic chuck which has a mounting surface where an object to be processed is mounted and which electrostatically attracts the object to be treated. The base portion comprises: a first upper surface where the electrostatic chuck is mounted; an annular second upper surface where a focus ring is mounted which is provided at a position outer than the first upper surface and lower than the first upper surface; and a side surface which extends in a vertical direction between the first upper surface and the second upper surface. The flow passage has a central flow passage and a peripheral flow passage. The central flow passage extends under the first upper surface. The peripheral flow passage extends under the second upper surface and includes a part which extends in a di